Minimum Feature Size — (F) ist eine Längeneinheit in der fotolithografischen Herstellung von Halbleiterelementen. Sie hat immer den Wert der kleinsten lithografisch herstellbaren Struktur. Da die Form und Zusammenstellung von Halbleiterelementen sich größtenteils nicht … Deutsch Wikipedia
Scale-invariant feature transform — Feature detection Output of a typical corner detection algorithm … Wikipedia
Sample size determination — is the act of choosing the number of observations to include in a statistical sample. The sample size is an important feature of any empirical study in which the goal is to make inferences about a population from a sample. In practice, the sample … Wikipedia
Photolithography — For earlier uses of photolithography in printing, see Lithography. For the same process applied to metal, see Photochemical machining. Photolithography (or optical lithography ) is a process used in microfabrication to selectively remove parts of … Wikipedia
nanotechnology — /nan euh tek nol euh jee, nay neuh /, n. any technology on the scale of nanometers. [1987] * * * Manipulation of atoms, molecules, and materials to form structures on the scale of nanometres (billionths of a metre). These nanostructures typically … Universalium
Coastline paradox — An example of the coastline paradox. If the coastline of Great Britain is measured using fractal units 100 … Wikipedia
Dip-pen nanolithography — (DPN) began as a scanning probe lithography technique where an atomic force microscope tip was used to transfer alkane thiolates to a gold surface. This technique allows surface patterning on scales of under 100 nanometers. DPN is the… … Wikipedia
Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength … Wikipedia
Superlens — A superlens, super lens or perfect lens is a lens which uses metamaterials to go beyond the diffraction limit. The diffraction limit is an inherent limitation in conventional optical devices or lenses.[1] In 2000, a type of lens was proposed,… … Wikipedia
Fotolithografie (Halbleitertechnik) — Die Fotolithografie (auch Photolithographie) ist eine der zentralen Methoden der Halbleiter und Mikrosystemtechnik zur Herstellung von integrierten Schaltungen und weiteren Produkten. Dabei wird mittels der Belichtung das Bild einer Fotomaske auf … Deutsch Wikipedia
